Controllable Growth of Few-Layer Niobium Disulfide by Atmospheric Pressure Chemical Vapor Deposition for Molecular Sensing
نویسندگان
چکیده
منابع مشابه
Spatially controllable chemical vapor deposition
Most conventional chemical vapor deposition (CVD) systems do not have the spatial actuation and sensing capabilities necessary to control deposition uniformity, or to intentionally induce nonuniform deposition patterns for single-wafer combinatorial CVD experiments. In an effort to address this limitation, a novel CVD reactor system has been developed that can explicitly control the spatial pro...
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ژورنال
عنوان ژورنال: Frontiers in Materials
سال: 2019
ISSN: 2296-8016
DOI: 10.3389/fmats.2019.00279